Graphite for ion implanters
- Product Info
- Technical Data
Overview
This is a strong material with high hardnes, high density, high durability (against ion beams) and low particle emissions.
Characteristics
Low consumption, low particle emissions
Durability against ion beams and low particle emissions make this a material suited for the use as parts for ion implanters.
High purity
The impurities lie below 100 ppm, and with high purity treatment, the impurities can be reduced to less than 5 ppm.
Function
Low consumption (resistance against ion beams), low particle emissions and high purity make this material suitable for the use for parts of ion implanters, what makes it possible to enhance the quality yield of the doped wafers.
Link to related technology
